000			00281nam a2200109Ia 4500
005			20250111125910.0
008			250111s9999 xx 000 0 und d
082			_a535/84
100			_aBrian Chapman
245		0	_aGlow Discharge Processes / Sputtering And Plasma Etching
650			_aPHY
999			_c7528 _d7528